Decylbenzene (CAS 104-72-3): A Foundation for Advanced Photoresist Solutions
The rapid pace of innovation in the electronics sector hinges on the development of advanced materials that enable ever-greater precision and miniaturization. Among these crucial materials, photoresists are fundamental, and their performance is often dictated by the quality of their constituent chemicals. Decylbenzene, identified by CAS number 104-72-3, is one such essential chemical compound, playing a foundational role in the creation of effective photoresist solutions. NINGBO INNO PHARMCHEM CO.,LTD. provides this critical component, understanding its significance in modern electronics manufacturing.
To fully grasp the importance of Decylbenzene, it's beneficial to examine its properties. This compound, also known by synonyms such as n-Decylbenzene or 1-Phenyldecane, is a colorless liquid with a molecular formula of C16H26 and a molecular weight of 218.38. Its physical characteristics, including a density of 0.858 g/cm³ and a boiling point of 293 °C, are key factors that make it suitable for use in photoresist formulations. These attributes influence how the material behaves during the photolithographic process, impacting the final resolution and quality of the patterned features. The physical properties of Decylbenzene are vital for its application in electronic chemicals, ensuring it integrates seamlessly into complex formulations.
The primary application of Decylbenzene in the electronics industry is within the realm of photoresist chemicals. These light-sensitive materials are indispensable for photolithography, the process used to pattern semiconductor wafers and printed circuit boards. Decylbenzene, when formulated into a photoresist, contributes to the material's sensitivity to light and its subsequent response to developing agents. This precise control over solubility changes is what allows for the transfer of intricate circuit designs, forming the microscopic pathways that power electronic devices. Explore how Decylbenzene contributes to advanced photoresist formulations, enabling precise patterning for semiconductors.
The role of phenyl decane in photoresist applications extends to enhancing the overall reliability and performance of the finished electronic components. By ensuring uniform application and consistent reactivity, Decylbenzene helps manufacturers achieve the high-resolution patterns required for cutting-edge microelectronics. The purity and stability of Decylbenzene are paramount for its use in sensitive electronic applications, ensuring predictable results and minimizing defects in the final electronic products. This makes it a dependable choice for companies striving for excellence in their production processes.
NINGBO INNO PHARMCHEM CO.,LTD. is committed to supporting the innovation and growth of the electronics sector by supplying high-quality Decylbenzene. Understanding the importance of this chemical compound in the broader field of electronic chemicals for microelectronics fabrication underscores its value to the technological supply chain. Reliable sourcing of such foundational chemicals is crucial for manufacturers seeking to maintain competitive advantages.
In summary, Decylbenzene (CAS 104-72-3) serves as a critical foundation for advanced photoresist solutions, enabling the high-precision manufacturing processes that define the modern electronics landscape. Its consistent quality and performance characteristics make it an invaluable asset for companies pushing the frontiers of technological development.
Perspectives & Insights
Logic Thinker AI
“Reliable sourcing of such foundational chemicals is crucial for manufacturers seeking to maintain competitive advantages.”
Molecule Spark 2025
“In summary, Decylbenzene (CAS 104-72-3) serves as a critical foundation for advanced photoresist solutions, enabling the high-precision manufacturing processes that define the modern electronics landscape.”
Alpha Pioneer 01
“Its consistent quality and performance characteristics make it an invaluable asset for companies pushing the frontiers of technological development.”