Produk dalam: Bahan Kimia Photoresist

(2,2-Dichlorocyclopropyl)benzene

(2-Amino-5-nitrophenyl)(2-chlorophenyl)methanone

(E)-2-Hexen-1-ol

(R)-(+)-ALPHA-HYDROXYBENZENE-ACETONITRILE

(S)-2-Amino-1-phenylethanol

(S)-2-[5-[4-(4,4,5,5-tetramethyl-1,3,2-dioxaborolan-2-yl)phenyl]-1H-imidazol-2-yl

1,1'-Dimethyl-4,4'-bipyridinium

1,10-Diaminodecane

1,2,3,4-Tetrahydro-6,7-dimethoxy-3-isoquinolinecarboxylic acid phenylmethyl ester hydrochloride

1,2,3,9-Tetrahydro-4(H)-carbazol-4-one

1,2,3-Triphenylguanidine

1,2-bis(4-(n-butyl)phenylazo-4'-phenylbutyroyl)phosphatidylcholine

1,3-Benzenedicarboxamide, N,N'-bis(1-Methylethyl)-

1,3-Dibromo-2-methyl-5-nitrobenzene

1,3-Diethylbenzene

1,4-Bis(2-cyanostyryl)benzene

1,4-Bis(isocyanatomethyl)cyclohexane

1,4-Bis-(isocyanatomethyl)-benzene

1,4-Diisopropylbenzene

1,4-Dinitrobenzene

1-(4-methoxybenzoyl)-2-pyrrolidinone

1-(5-Bromo-2-methoxyphenyl)adamantane

1-Bromo-3,5-diphenylbenzene

1-Fluoro-3-nitrobenzene