제품 카테고리: 포토레지스트 화학물질

(R)-3-페닐락트산

(S)-2-아미노-1-페닐에탄올

[1,3]디옥솔로[4,5-g]신놀린-3-카르복실산, 1-에틸-1,4-디하이드로-4-옥소-

1-(4-메톡시벤조일)-2-피롤리디논

1-(4-피리딜)피페라진

1-[[4-[(4,5,6,7-Tetrachloro-3-oxo-isoindoline-1-ylidene)amino]phenyl]azo]-2-hydroxy-N-(4-methoxy-2-m

1-Bromo-3,5-diphenylbenzene

1-아다만탄올

1-프로판설폰산, 2,3-다이머캅토-, 소듐염

1-플루오로-3-니트로벤젠

1,1-사이클로헥산디아세트산

1,1'-디메틸-4,4'-바이피리디늄

1,2-에폭시-5-헥센

1,2,3-트리페닐구아니딘

1,3-디브로모-2-메틸-5-니트로벤젠

1,3-디에틸벤젠

1,4-다이나이트로벤젠

1,4-벤조퀴논 디옥심

1,8-디아자플루오렌-9-온

11,12-디하이드로-11-페닐인돌로[2,3-a]카바졸

1H-페리미딘-2-아민, 브롬화수소염, 수화물 (1:1:1)

1H,4H-[1,3]Thiazeto[3,2-a]quinoline-3-carboxylic acid, 6-fluoro-1-methyl-4-oxo-7-(1-piperazinyl)-

2-(Diethylamino)-N-(2,4,6-trimethylphenyl)acetamide Monohydrochloride

2-Ethoxybenzamide