In the relentless pursuit of miniaturization and enhanced performance in the semiconductor industry, the selection of precise chemical components is paramount. Among these critical materials is Ethyl 1-methylbutyl cyanoacetate (CAS 100453-11-0), an organic compound that plays a significant role in the formulation of advanced photoresists. This article, brought to you by NINGBO INNO PHARMCHEM CO.,LTD., delves into the properties and applications of this essential chemical intermediate.

Ethyl 1-methylbutyl cyanoacetate, often found by its CAS number 100453-11-0, is classified under electronic chemicals, specifically within the photoresist chemicals category. Its molecular formula, C12H21NO2, and a molecular weight of 211.30 hint at its complex structure, which is optimized for specific chemical functionalities. The chemical synthesis of such compounds requires meticulous control over reaction parameters to achieve the high purity demanded by the electronics sector. NINGBO INNO PHARMCHEM CO.,LTD. understands the importance of this purity for reliable performance.

The primary application of Ethyl 1-methylbutyl cyanoacetate lies in its contribution to photoresist compositions. Photoresists are light-sensitive materials used in photolithography to transfer geometric patterns from a photomask onto a substrate, typically a silicon wafer. This process is fundamental to the fabrication of integrated circuits and other microelectronic devices. In particular, the compound is valuable in formulations for deep ultraviolet (DUV) lithography, a technology that enables the creation of increasingly smaller and more complex circuit features.

The unique properties of Ethyl 1-methylbutyl cyanoacetate, such as its boiling point of 240.784 °C and a flash point of 105.074 °C, are carefully considered during the formulation of photoresists. These characteristics influence the stability, solubility, and processing behavior of the resist material. The demand for high-purity Ethyl 1-methylbutyl cyanoacetate in the market is driven by the stringent quality requirements of semiconductor manufacturing. Companies seeking to buy Ethyl 1-methylbutyl cyanoacetate often look for reliable suppliers who can guarantee consistent quality and timely delivery.

As a versatile organic intermediate, Ethyl 1-methylbutyl cyanoacetate is not only crucial for current DUV lithography but also contributes to ongoing research and development in next-generation lithographic techniques. Its inclusion in a photoresist formulation can impact critical parameters like etch resistance and transparency at specific wavelengths, directly affecting the resolution and fidelity of the patterned features. For businesses looking to source this essential component, understanding its chemical synthesis pathways and its precise role in electronic chemicals is key to achieving optimal manufacturing outcomes. NINGBO INNO PHARMCHEM CO.,LTD. is committed to providing high-quality chemical solutions that drive innovation in the global technology landscape.