Ethyl 1-methylbutyl Cyanoacetate: A Key Component in Advanced Lithography
Discover the properties and applications of this vital chemical for semiconductor innovation.
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Ethyl 1-methylbutyl cyanoacetate
Ethyl 1-methylbutyl cyanoacetate (CAS 100453-11-0) is a critical organic intermediate widely utilized in the electronic chemicals sector. Its unique molecular structure and properties make it indispensable for the formulation of advanced photoresist compositions, particularly those designed for deep ultraviolet lithography processes. Understanding the precise chemical synthesis of such materials is crucial for optimizing performance in semiconductor manufacturing.
- Synthesis of Ethyl 1-methylbutyl cyanoacetate involves precise chemical reactions to ensure high purity, vital for its role in demanding electronic applications.
- The applications of Ethyl 1-methylbutyl cyanoacetate are primarily focused on its use in photoresist formulations, enabling the intricate patterning required for modern microelectronics.
- As a key electronic chemicals intermediate, it contributes to the development of next-generation semiconductor devices by improving resolution and process efficiency.
- The specific properties of CAS 100453-11-0, such as its boiling point and density, are critical parameters for formulators in the electronic chemicals industry.
Key Advantages in Application
Enhanced Lithographic Performance
Leveraging Ethyl 1-methylbutyl cyanoacetate applications in photoresist technology leads to significant improvements in resolution and line edge roughness, crucial for semiconductor advancements.
Purity and Consistency
The demand for high-purity organic intermediates like Ethyl 1-methylbutyl cyanoacetate ensures reliable and reproducible results in sensitive electronic manufacturing processes.
Foundation for Innovation
As a fundamental component in UV curing materials, this chemical serves as a building block for innovation in various high-tech industries.
Key Applications
Photoresist Formulations
Essential component in photoresist compositions for advanced microlithography, enabling precise pattern transfer in semiconductor fabrication.
Deep Ultraviolet (DUV) Lithography
Critical for DUV lithography processes, where its specific chemical properties ensure high transparency and etch resistance.
Chemical Synthesis Intermediate
Serves as a versatile intermediate in the synthesis of complex organic molecules for various industrial applications.
Electronic Materials Development
Contributes to the development of novel electronic materials, pushing the boundaries of technological capabilities.