News Articles Tagged: Photoresist Sensitivity

2-Acetylpyridine: A Key Enabler for High-Speed Two-Photon Lithography

Discover how 2-Acetylpyridine (CAS 1122-62-9) is revolutionizing two-photon lithography by enhancing photoresist sensitivity for faster, more precise 3D nano-fabrication. Learn more from NINGBO INNO PHARMCHEM CO.,LTD.

Leveraging 2-Methylbenzeneacetonitrile for Enhanced Photoresist Performance

Discover how 2-methylbenzeneacetonitrile (PAG103) enhances photoresist performance through improved UV sensitivity and catalytic acid generation, crucial for advanced lithography.