Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)indium(III): A Versatile Organometallic Compound

Discover the advanced applications and properties of this key organometallic precursor for catalysis and electronics.

Get a Quote & Sample

Key Advantages

High Purity and Assay

Achieve superior results in your research and production with a compound that boasts an assay of u226599%, ensuring consistency and reliability for demanding applications.

Thermal Stability

Benefit from the compound's thermal stability, allowing for effective use in high-temperature processes such as thin film deposition.

Versatile Reactivity

Leverage the compound's versatile reactivity for a broad spectrum of applications, from organic synthesis to the development of novel electronic materials.

Key Applications

Chemical Catalysis

Utilize this organometallic compound as a catalyst in organic synthetic reactions to improve yields and reaction pathways.

Photoelectric Materials

Serve as a vital precursor in the development of cutting-edge photoelectric devices, including LEDs and OLEDs.

Thin Film Deposition

Enable the creation of high-quality indium oxide films through chemical vapor deposition (CVD) and atomic layer deposition (ALD).

Research & Development

Explore the potential biological activities, such as cytotoxicity and antioxidant effects, for applications in therapeutic research and development.