Hexamethylcyclotrisilazane: A Key Player in Advanced Materials
Explore the properties and diverse industrial applications of this vital organosilicon compound.
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Hexamethylcyclotrisilazane
1,1,3,3,5,5-Hexamethylcyclotrisilazane, identified by CAS number 1009-93-4, is a critical organosilicon compound valued for its unique chemical structure and extensive industrial utility. Its molecular formula is C6H21N3Si3, with a molecular weight of 219.51 g/mol. It presents as a clear, colorless liquid with a melting point of -10°C and a boiling point of 188°C at 760 mmHg. This compound is instrumental in several high-tech sectors.
- Discover the crucial role of 1,1,3,3,5,5-Hexamethylcyclotrisilazane applications in enabling advanced material properties and industrial processes.
- Learn how this hexamethylcyclotrisilazane semiconductor precursor is vital for depositing high-quality silicon nitride films.
- Understand its function as a silylation agent in organic synthesis, protecting reactive hydrogens in various functional groups.
- Explore its significance in material science for creating durable, high-performance coatings and adhesives.
Key Advantages Offered
Enhanced Material Performance
Leveraging its properties as a chemical precursor, this compound significantly boosts the performance of materials, particularly in semiconductor applications, contributing to their reliability and efficiency.
Versatile Chemical Reactivity
As a silylation agent in organic synthesis, it offers controlled protection and modification of functional groups, broadening the scope of chemical transformations achievable.
Industrial Process Enablement
Its role as a polymerization initiator aids in the development of advanced polymers, making it indispensable in industries requiring novel material functionalities and robust manufacturing processes.
Key Applications
Semiconductor Manufacturing
Utilized as a precursor for silicon nitride and silicon carbonitride films, essential for insulating properties and thermal stability in semiconductor devices, showcasing its importance in the semiconductor industry.
Material Science Innovations
Its use in developing high-performance coatings, sealants, and adhesives stems from its excellent thermal stability and chemical resistance, driving innovation in advanced materials.
Organic Synthesis
Functioning as a silylation agent, it efficiently protects reactive hydrogens in alcohols, amines, thiols, and carboxylic acids, facilitating complex organic transformations.
Photoresist Formulations
As an additive in photoresist formulations, it enhances adhesion and resistance to etching processes during semiconductor fabrication, improving manufacturing yields.