Discover N-Ethyl-N-benzylaniline-3'-sulfonic Acid: A Key Component in Modern Electronics

Explore the essential properties and critical applications of this vital chemical in advanced manufacturing.

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Advantages of Utilizing This Specialty Chemical

Precision in Photoresist Applications

The accurate synthesis of semiconductor photoresist components is crucial. Understanding the chemical structure of N-Ethyl-N-benzylaniline-3'-sulfonic acid aids in achieving the desired performance in lithography.

Reliable Sourcing for Electronic Manufacturing

Access to dependable electronic chemicals suppliers is vital for consistent production. Identifying manufacturers who produce CAS 101-11-1 ensures supply chain stability.

Versatile Chemical Intermediate

As a sulfonic acid derivative, it serves as a valuable intermediate, enabling diverse chemical reactions for specialized applications in the electronic industry.

Key Applications

Photoresist Formulations

This chemical is a key ingredient in the precise formulation of photoresists, essential for pattern transfer in semiconductor manufacturing, supporting the development of microelectronic devices.

Electronic Manufacturing

Its use extends across various electronic manufacturing processes where specific chemical properties are required for coating, etching, or material modification.

Semiconductor Industry

The stringent requirements of the semiconductor industry demand high-purity chemicals like N-Ethyl-N-benzylaniline-3'-sulfonic acid for intricate fabrication steps.

Chemical Intermediates

As a versatile chemical intermediate, it can be utilized in the synthesis of other specialized compounds for diverse industrial applications, enhancing its market value.