Exploring the Chemical Properties of N-Stearoyl-L-glutamate Sodium Salt
Understanding the intricate chemical properties of raw materials is fundamental to their effective application in advanced manufacturing processes. N-Stearoyl-L-glutamate Sodium Salt, identified by its CAS number 38517-23-6, is a compound whose specific chemical characteristics make it highly valuable, particularly within the domain of electronic chemicals and photoresist formulations.
NINGBO INNO PHARMCHEM CO.,LTD., a leading chemical manufacturer in China, provides this compound with precise specifications. The molecular formula of N-Stearoyl-L-glutamate Sodium Salt is C23H42NNaO5, with a molecular weight of 435.57305. This structure consists of a stearoyl group (derived from stearic acid, a long-chain fatty acid) attached to the amino group of L-glutamic acid, with the carboxylic acid group of glutamic acid being neutralized by sodium. This amphipathic nature, possessing both hydrophobic (stearoyl chain) and hydrophilic (sodium glutamate) segments, is key to its functionality.
These chemical properties are particularly advantageous when N-Stearoyl-L-glutamate Sodium Salt is used in photoresist chemicals. Its structure can influence surface tension, adhesion, and film-forming characteristics, all critical for achieving accurate pattern transfer during photolithography. The compound's stability and reactivity profile are essential for its performance in these sensitive applications. As a supplier of high-quality electronic chemicals, NINGBO INNO PHARMCHEM CO.,LTD. ensures that the purity and consistency of these properties are maintained.
The exploration of such compounds underscores the importance of advanced organic chemistry in developing next-generation materials. Our commitment as a specialty chemical provider is to offer materials that empower innovation. By understanding the detailed chemical makeup of products like N-Stearoyl-L-glutamate Sodium Salt, researchers and manufacturers can better leverage their potential in developing improved photoresist chemicals and other advanced electronic materials. NINGBO INNO PHARMCHEM CO.,LTD. is dedicated to supporting these advancements through reliable chemical supply and technical expertise.
NINGBO INNO PHARMCHEM CO.,LTD., a leading chemical manufacturer in China, provides this compound with precise specifications. The molecular formula of N-Stearoyl-L-glutamate Sodium Salt is C23H42NNaO5, with a molecular weight of 435.57305. This structure consists of a stearoyl group (derived from stearic acid, a long-chain fatty acid) attached to the amino group of L-glutamic acid, with the carboxylic acid group of glutamic acid being neutralized by sodium. This amphipathic nature, possessing both hydrophobic (stearoyl chain) and hydrophilic (sodium glutamate) segments, is key to its functionality.
These chemical properties are particularly advantageous when N-Stearoyl-L-glutamate Sodium Salt is used in photoresist chemicals. Its structure can influence surface tension, adhesion, and film-forming characteristics, all critical for achieving accurate pattern transfer during photolithography. The compound's stability and reactivity profile are essential for its performance in these sensitive applications. As a supplier of high-quality electronic chemicals, NINGBO INNO PHARMCHEM CO.,LTD. ensures that the purity and consistency of these properties are maintained.
The exploration of such compounds underscores the importance of advanced organic chemistry in developing next-generation materials. Our commitment as a specialty chemical provider is to offer materials that empower innovation. By understanding the detailed chemical makeup of products like N-Stearoyl-L-glutamate Sodium Salt, researchers and manufacturers can better leverage their potential in developing improved photoresist chemicals and other advanced electronic materials. NINGBO INNO PHARMCHEM CO.,LTD. is dedicated to supporting these advancements through reliable chemical supply and technical expertise.
Perspectives & Insights
Future Origin 2025
“Its structure can influence surface tension, adhesion, and film-forming characteristics, all critical for achieving accurate pattern transfer during photolithography.”
Core Analyst 01
“The compound's stability and reactivity profile are essential for its performance in these sensitive applications.”
Silicon Seeker One
“The exploration of such compounds underscores the importance of advanced organic chemistry in developing next-generation materials.”