In the intricate world of semiconductor manufacturing, the quality of photoresist materials is paramount. These light-sensitive polymers form the blueprint for creating the microscopic circuits that power our modern technology. Among the specialized chemicals contributing to high-performance photoresists is Norsolorinic Acid, known by its CAS number 10254-99-6. For R&D scientists and product formulators, understanding the precise role of such compounds is key to innovation and efficient production. This article explores the significance of Norsolorinic Acid in advanced photoresist formulations and guides buyers on sourcing this essential electronic chemical from China.

Norsolorinic Acid, chemically identified as 2-n-Hexanoyl-1,3,6,8-tetrahydroxyanthraquinone with the molecular formula C20H18O7, is an organic compound that finds its niche within the electronic chemicals sector. Its specific chemical structure, an anthraquinone derivative, provides it with properties that are beneficial when incorporated into photoresist systems. The precise contribution of Norsolorinic Acid can vary depending on the specific photoresist chemistry it is used in, but it generally relates to influencing the material's response to light and its subsequent development characteristics.

Impact on Photoresist Performance:

The goal of any photoresist formulation is to achieve precise pattern transfer during photolithography. This involves several critical steps where the chemical composition of the resist plays a vital role:

  • Light Sensitivity and Absorption: Components like Norsolorinic Acid can affect how the photoresist absorbs light at specific wavelengths used in lithography. This influences the exposure dose required and the overall sensitivity of the resist.
  • Resolution and Line Edge Roughness: The chemical interactions during exposure and post-exposure baking, influenced by ingredients such as Norsolorinic Acid, are critical for achieving high resolution and minimizing line edge roughness. These factors are crucial for the performance of densely packed circuits.
  • Development Characteristics: The solubility of the exposed or unexposed areas in the developer solution is a key factor in pattern formation. The properties of Norsolorinic Acid can be tailored to optimize this development process, ensuring faithful replication of the mask pattern.

Sourcing Norsolorinic Acid for Your Formulations

As a critical ingredient, securing a consistent and high-quality supply of Norsolorinic Acid is vital for manufacturers. For companies looking to purchase this compound, China offers a robust supply base. When sourcing from Chinese manufacturers:

  • Verify Purity and Specifications: Ensure the Norsolorinic Acid (CAS 10254-99-6) meets your exact requirements, often provided on a Certificate of Analysis (CoA).
  • Assess Manufacturer Reliability: Look for established suppliers with a proven track record in electronic chemicals. Consider their production capacity and quality control measures.
  • Request Samples: Always test samples before committing to bulk orders to confirm performance in your specific photoresist formulations.
  • Negotiate Pricing: Engage in discussions for bulk purchases to obtain competitive pricing and favorable terms.

We are a leading manufacturer and supplier of Norsolorinic Acid and other electronic chemicals. Our commitment to quality and consistent supply makes us an ideal partner for companies developing advanced photoresists. We invite R&D scientists and product formulators to contact us for inquiries regarding pricing, bulk orders, and samples of Norsolorinic Acid (CAS 10254-99-6).