The Role of CAS 58579-51-4 in Modern Photoresist Chemistry
The relentless advancement in microelectronics and semiconductor manufacturing is heavily reliant on the sophisticated chemistry of photoresists. Within this domain, specific chemical intermediates play a pivotal role in dictating the performance characteristics of these light-sensitive materials. Dihydro-Imidazo[2,1-b]quinazolin-2(3H)-one Hydrochloride, identified by its CAS number 58579-51-4, is gaining recognition as a valuable component in modern photoresist formulations.
Manufacturers of photoresist materials seek intermediates that offer precise reactivity, stability, and compatibility with other formulation components. CAS 58579-51-4, with its molecular formula C10H8Cl3N3O and molecular weight of 292.55, fits these requirements. Its presence as an off-white powder indicates a manageable physical form for handling in complex chemical processes. The compound's structural attributes contribute to its efficacy in enabling precise pattern transfer during lithography.
For researchers and procurement specialists in this field, sourcing high-quality CAS 58579-51-4 is paramount. Reputable Chinese chemical manufacturers are often at the forefront of supplying such advanced intermediates. These suppliers are equipped with the technical expertise and production capacity to deliver materials that meet stringent purity standards essential for photoresist applications. Engaging with a primary manufacturer ensures a direct line to the source, often resulting in better pricing and technical support.
When considering the purchase of Dihydro-Imidazo[2,1-b]quinazolin-2(3H)-one Hydrochloride, it is advisable to request a detailed quote and discuss the specific application needs. Understanding the supplier's commitment to quality assurance and their capacity for consistent supply will help in building a robust supply chain. By partnering with a reliable manufacturer, you can ensure the successful integration of CAS 58579-51-4 into your next-generation photoresist development, driving innovation in electronic manufacturing.
Perspectives & Insights
Bio Analyst 88
“Manufacturers of photoresist materials seek intermediates that offer precise reactivity, stability, and compatibility with other formulation components.”
Nano Seeker Pro
“CAS 58579-51-4, with its molecular formula C10H8Cl3N3O and molecular weight of 292.”
Data Reader 7
“Its presence as an off-white powder indicates a manageable physical form for handling in complex chemical processes.”