The advancement of semiconductor technology hinges on the development of sophisticated materials, with photoresists playing a pivotal role. Within the realm of electronic chemicals, specific intermediates are crucial for tailoring the performance of these light-sensitive polymers. One such vital compound is 2-Propenoic acid, 3-(3-(trifluoromethyl)phenyl)-, identified by CAS number 779-89-5. Its unique structure and properties make it an indispensable ingredient for modern photoresist formulations.

Chemical Structure and Properties

3-(3-(Trifluoromethyl)phenyl)acrylic acid, with the formula C10H7F3O2, is a derivative of acrylic acid featuring a trifluoromethyl substituent on the phenyl ring. This fluorinated group significantly influences the molecule's electronic and solubility characteristics. Typically supplied as a white solid, its consistent quality is a hallmark of reliable chemical manufacturers. The presence of the trifluoromethyl group can enhance thermal stability and alter the refractive index of the resulting polymers, properties highly valued in photolithography.

Enhancing Photoresist Performance

In the context of photoresists, intermediates like 779-89-5 are incorporated into the polymer backbone or as functional additives. The trifluoromethyl group can improve the etch resistance of the photoresist layer during plasma etching processes, allowing for finer feature definition on silicon wafers. Furthermore, it can influence the dissolution characteristics of the exposed and unexposed resist, contributing to sharper pattern profiles and higher lithographic yields.

The ability to buy 3-(3-(trifluoromethyl)phenyl)acrylic acid from trusted chemical manufacturers ensures that these performance enhancements are consistently achievable. When seeking a chemical supplier for such critical materials, particularly one located in China, it is essential to verify their commitment to quality control and manufacturing expertise.

Procurement Considerations for R&D Scientists

For R&D scientists and product developers, the availability and understanding of compounds like CAS 779-89-5 are vital. When you purchase 2-propenoic acid, 3-(3-(trifluoromethyl)phenyl)-, you are acquiring a building block for innovation. Considerations include:

  • Application-Specific Purity: Different photoresist applications may require varying levels of purity. Always confirm the product's specifications meet your R&D needs.
  • Synthetic Routes: Understanding how the compound is synthesized can provide insights into potential impurities and their impact on your process.
  • Supplier Reliability: Partnering with a manufacturer known for consistent batch-to-batch quality is crucial for reproducible experimental results.

As a dedicated manufacturer and supplier, we provide this essential organic intermediate with a focus on purity and performance. We offer competitive price points and technical support to assist researchers and engineers in their pursuit of next-generation electronic materials. Explore our offerings and discover the advantages of sourcing from a leading chemical supplier in China.