Photolithography, the cornerstone of microelectronic fabrication, relies on a sophisticated array of chemicals to define intricate patterns on semiconductor substrates. Among these critical materials are photoresists, and their performance is often dictated by the quality of their chemical constituents. This article focuses on 6-Hydroxy-2-methylaminopurine (CAS 10030-78-1), a compound of notable importance within the electronic chemicals industry, particularly for its role in advanced photolithography. As a dedicated manufacturer and supplier, we aim to provide valuable insights for R&D professionals and procurement managers.

6-Hydroxy-2-methylaminopurine, identifiable by its CAS number 10030-78-1 and chemical formula C6H7N5O, is a compound that serves as a vital intermediate. Its structure, related to guanine, lends it properties that are advantageous in the formulation of photoresists. Known by synonyms such as N2-Methylguanine or 2-Methylamino-6-oxopurine, this chemical typically presents as a white crystalline solid. Its molecular weight of 165.15 is a standard reference point for chemical purchasers.

The application of CAS 10030-78-1 in photolithography primarily centers on its use in photoresist formulations. The precise chemical behavior of this intermediate can influence the sensitivity of the photoresist, the resolution of the patterned features, and the adhesion of the resist layer to the wafer. As the semiconductor industry continues to push for smaller feature sizes and higher densities, the demand for high-purity, well-characterized intermediates like 6-Hydroxy-2-methylaminopurine grows.

For procurement managers, the ability to buy this compound from a reliable source is paramount. As a leading chemical supplier based in China, we understand the critical need for consistent quality and timely delivery. We ensure that our 6-Hydroxy-2-methylaminopurine meets the exacting purity standards required for photolithographic applications. Our pricing is competitive, reflecting our commitment to supporting the global electronics manufacturing sector.

R&D scientists exploring novel photoresist systems can leverage the unique properties of N2-Methylguanine. Its structure offers potential for fine-tuning the optical and chemical characteristics of photoresists, enabling advancements in lithographic techniques. We encourage collaboration and provide comprehensive product information to assist researchers in their material selection process. When you choose to buy 2-Methylamino-6-oxopurine from us, you are gaining access to a high-quality chemical backed by technical expertise.

In conclusion, 6-Hydroxy-2-methylaminopurine (CAS 10030-78-1) is a key chemical intermediate with a significant impact on advanced photolithography. Its reliable supply and high purity are critical for the semiconductor industry. We invite all stakeholders in the field to consider us their trusted partner for sourcing this essential compound. Reach out to us to discuss your requirements and experience the advantages of partnering with a dedicated chemical manufacturer and supplier in China.