For chemical engineers, product formulators, and procurement specialists in the electronics sector, a deep understanding of chemical properties is fundamental. This is particularly true when it comes to specialized intermediates like [3-(MERCAPTOMETHYL)-2,4,6-TRIMETHYLPHENYL]METHANETHIOL, identified by its CAS number 10074-13-2. This compound is a significant player in the development of photoresists, and knowing its characteristics is key to leveraging its full potential. Let's examine the properties of CAS 10074-13-2 that make it valuable for photoresist applications and discuss how to source it from reputable manufacturers.

Key Properties of CAS 10074-13-2 Relevant to Photoresists

The chemical structure of [3-(MERCAPTOMETHYL)-2,4,6-TRIMETHYLPHENYL]METHANETHIOL contributes to its specific reactivity and compatibility within complex photoresist formulations. While detailed technical specifications are best obtained directly from a manufacturer, general properties that are crucial for its application include:

  • Molecular Structure: The presence of thiol groups and the specific arrangement of the trimethylphenyl ring are critical for its function in photoresist chemistry, influencing cross-linking or other photo-induced reactions.
  • Purity: As mentioned previously, high purity is non-negotiable for electronic applications. Manufacturers typically provide purity levels that meet the stringent demands of semiconductor fabrication.
  • Solubility: Its solubility characteristics in common photoresist solvents are vital for achieving homogeneous formulations and consistent film formation on wafers.
  • Thermal Stability: Understanding its behavior under thermal processing conditions is important for ensuring the integrity of the photoresist layer during baking steps.

Applications in Photoresist Development

In photoresist systems, intermediates like CAS 10074-13-2 can act as sensitizers, cross-linking agents, or components that modify the resist's etch resistance or adhesion properties. Their incorporation allows formulators to fine-tune the performance of the photoresist to meet the demands of advanced lithography, such as higher resolution and improved process latitude. Purchasing this compound from a reliable manufacturer in China ensures that formulators have access to a consistent building block for their cutting-edge research and product development.

Choosing a Manufacturer for CAS 10074-13-2

When you need to buy [3-(MERCAPTOMETHYL)-2,4,6-TRIMETHYLPHENYL]METHANETHIOL, prioritizing manufacturers who specialize in electronic chemicals is a smart strategy. These suppliers are more likely to understand the critical quality parameters and provide the necessary technical support. Engaging with suppliers based in China can offer cost advantages, but thorough vetting is essential. Always request samples for testing and verify their production capabilities and quality control processes before placing large orders.

Conclusion

The detailed properties of [3-(MERCAPTOMETHYL)-2,4,6-TRIMETHYLPHENYL]METHANETHIOL CAS 10074-13-2 are key to its successful application in photoresists. By understanding these characteristics and partnering with experienced manufacturers, R&D scientists and procurement professionals can ensure they are using the highest quality materials for their demanding electronic manufacturing needs. If you are in the market for this essential chemical, contact a leading supplier in China to learn more and get a quote.