In the intricate world of advanced manufacturing, specific chemical compounds often serve as the linchpins for groundbreaking technologies. One such compound, identified by its CAS number 103621-96-1, is an azobenzene derivative that holds significant promise for the field of photolithography, a cornerstone of modern microelectronics and semiconductor fabrication. For those looking to buy this specialized chemical, understanding its nature and applications is the first step.

The chemical name for CAS 103621-96-1 is 11H-Benzo[a]carbazole-3-carboxamide, 2-hydroxy-N-(4-methoxy-2-methylphenyl)-1-[2-[4-[(4,5,6,7-tetrachloro-1-oxo-1H-isoindol-3-yl)amino]phenyl]diazenyl]-. This complex nomenclature hints at a sophisticated molecular architecture, featuring multiple aromatic rings, chlorine atoms, and the characteristic azobenzene functional group. Such structural complexity is often engineered to impart specific properties essential for high-performance photoresists, including tailored spectral sensitivity, dissolution characteristics, and thermal stability.

The primary application domain for this compound, as indicated by its classification within 'Photoresist Chemicals' and 'Electronic Chemicals', is in the formulation of photolithographic materials. Photoresists are light-sensitive polymers that undergo chemical changes when exposed to specific wavelengths of light, allowing for the creation of precise patterns on substrates like silicon wafers. The azobenzene moiety within CAS 103621-96-1 can contribute to the photo-responsive behavior of the resist, enabling features like controlled solubility changes or cross-linking upon irradiation.

For researchers, R&D scientists, and product formulators in the electronics industry, sourcing such specialized chemicals requires reliable partners. Leading chemical suppliers and manufacturers, particularly those based in China, are key players in making these advanced materials accessible. When seeking a supplier for CAS 103621-96-1, it is important to inquire about product purity, batch consistency, and the availability of technical data. These factors are crucial for ensuring reproducible results in demanding photolithographic processes. The price can vary, so comparing quotes from multiple trusted sources is advisable.

The development of new photoresist technologies is a continuous process, driven by the relentless miniaturization and increasing complexity of electronic devices. Compounds like CAS 103621-96-1 represent the cutting edge of material science in this field. Whether you are developing next-generation microprocessors, advanced displays, or other high-tech components, understanding and procuring these critical chemical building blocks from reliable manufacturers is essential for successful innovation and production.