Bis-(4-tert-butylphenyl)-iodonium tetrakis(pentafluorophenyl)borate, identified by its CAS number 198641-40-6, stands as a critical compound in advanced material science. This white powder, with a molecular formula of C24BF20.C20H26I and a molecular weight of 1072.36, is renowned for its purity, boasting an assay of ≥99.0%. Its remarkable stability, indicated by a decomposition point between 180 °C and 230 °C, along with minimal loss on drying (≤1.0%) and very low insoluble matter (≤0.1%), underscores its suitability for demanding industrial applications.

At its core, this compound functions as a highly efficient photoinitiator, specifically categorized as a photoacid generator (PAG). Photoacid generators are molecules engineered to become more acidic or to release strong acids upon exposure to light. This light-induced acid generation is a fundamental process in numerous high-tech manufacturing fields, particularly where precise chemical reactions are required under controlled conditions.

PAGs like Bis-(4-tert-butylphenyl)-iodonium tetrakis(pentafluorophenyl)borate are broadly classified into ionic and non-ionic types. This specific compound belongs to the ionic category, typically operating as an iodonium salt. Upon illumination, the cationic part of the PAG absorbs light energy, leading to a series of photolysis and recombination reactions that ultimately liberate a strong acid. This irreversible generation of acid is what makes it highly effective for applications where a sustained acidic environment is needed post-exposure.

The applications of Bis-(4-tert-butylphenyl)-iodonium tetrakis(pentafluorophenyl)borate are diverse and impactful. One of its most significant roles is in photolithography, a cornerstone technology in the microelectronics industry for manufacturing semiconductor devices, integrated circuits, and flat panel displays. In this context, PAGs are essential components of chemically amplified (CA) photoresists. When exposed to UV light, the generated acid catalyzes a chemical change in the polymer resin of the photoresist, either breaking down or cross-linking the material. This creates a difference in solubility between exposed and unexposed areas, enabling the precise patterning of circuits and components.

Beyond microelectronics, this photoacid generator is also vital in the catalysis of polymerization reactions. It is particularly effective in the cationic polymerization of epoxy resins and oxetanes, processes crucial for producing durable coatings, adhesives, and advanced composite materials. The acid released by the PAG initiates the polymerization, allowing for controlled curing and hardening of these materials with light, which offers advantages in terms of speed, energy efficiency, and solvent-free processing.

Furthermore, its utility extends to deprotection reactions in resist resins and condensation-type cross-linking reactions involving phenolic resins. The ability of the generated acid to precisely cleave protective groups or facilitate cross-linking reactions makes it an invaluable tool for creating intricate structures and modifying material properties with high fidelity.

NINGBO INNO PHARMCHEM CO.,LTD. is a reputable manufacturer and supplier of high-quality chemical intermediates and active pharmaceutical ingredients, including Bis-(4-tert-butylphenyl)-iodonium tetrakis(pentafluorophenyl)borate. We are committed to providing superior products that meet stringent industry standards. Our dedication to quality ensures that our clients receive materials with consistent performance and reliability for their critical applications. For inquiries regarding the price, availability, or to buy and purchase Bis-(4-tert-butylphenyl)-iodonium tetrakis(pentafluorophenyl)borate, please reach out to our professional sales team. We offer customized packaging and efficient shipping solutions tailored to your specific needs, ensuring a seamless supply chain experience.