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NINGBO INNO PHARMCHEM CO.,LTD. provides detailed information on the chemical properties of Octyl Trichlorosilane (CAS 5283-66-9), a crucial chemical intermediate. Grasping these properties is key for anyone looking to buy Octyl Trichlorosilane for specific applications, ensuring optimal performance and process efficiency.
Octyl Trichlorosilane, with the molecular formula C8H17Cl3Si and a molecular weight of approximately 247.66 g/mol, is characterized by its reactive trichlorosilane functional group and a hydrophobic octyl chain. The presence of three chlorine atoms bonded to silicon makes the silicon atom highly electrophilic, rendering the compound susceptible to nucleophilic attack, particularly by water and alcohols. This reactivity is the basis for its use in hydrolysis and condensation reactions, forming siloxane bonds and leading to surface modifications or polymer formation.
Key physical and chemical properties include its appearance as a clear liquid, a boiling point typically around 224-226 °C, and a density of approximately 1.0744 g/mL. Its flash point is around 96 °C, indicating a moderate flammability hazard. The compound is sensitive to moisture, a property that is both a benefit (for hydrolysis-based reactions) and a consideration for handling and storage. The high purity, often specified at 97% or higher, is critical for predictable chemical behavior.
As a leading manufacturer and supplier in China, NINGBO INNO PHARMCHEM CO.,LTD. ensures that the Octyl Trichlorosilane we provide adheres to precise specifications. This attention to detail is vital for applications such as surface treatment, where the controlled reaction of the silane is paramount for achieving desired surface energy and chemical resistance.
For scientists and engineers seeking to leverage the unique chemical profile of Octyl Trichlorosilane, NINGBO INNO PHARMCHEM CO.,LTD. offers a reliable source. Understanding its reactivity, stability, and physical state is the first step towards unlocking its full potential in your chemical synthesis and material development projects.
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