Speciality Chemicals

Customized specialty chemicals tailored to meet unique industrial requirements.

Basic Cupric Sulfate
CAS No. 12527-76-3

Basic Cupric Sulfate

High purity basic cupric sulfate designed for agricultural fungicide and industrial sterilization applications with strict quality control.

View Details →
Tribromofluoromethane
CAS No. 353-54-8

Tribromofluoromethane

High-purity Tribromofluoromethane liquid for advanced organic synthesis and fluorinated material development.

View Details →
Perfluorohexylethyl Iodide
CAS No. 2043-57-4

Perfluorohexylethyl Iodide

High-purity Perfluorohexylethyl Iodide for advanced fluorination synthesis. Ideal for pharmaceutical and new material R&D with reliable supply.

View Details →
UV Absorber NP3
CAS No. 586400-06-8

UV Absorber NP3

UV Absorber NP3 is a high-performance formamidine-type ultraviolet light absorber designed for polymers and polyurethanes.

View Details →
Bis-(1-octyloxy-2,2,6,6-tetramethyl-4-piperidinyl) Sebacate
CAS No. 129757-67-1

Bis-(1-octyloxy-2,2,6,6-tetramethyl-4-piperidinyl) Sebacate

High-performance hindered amine light stabilizer designed for automotive and industrial coatings. Offers superior weathering resistance and low volatility in liquid form.

View Details →
Polyquaternium-7
CAS No. 26590-05-6

Polyquaternium-7

Polyquaternium-7 is a versatile cationic polyelectrolyte used for water treatment and personal care applications.

View Details →
Adipic Polyester
CAS No. 24937-93-7

Adipic Polyester

High-performance polymeric plasticizer designed for PVC and PU systems, offering superior durability and low migration properties.

View Details →
2,3,3,3-Tetrafluoropropene
CAS No. 754-12-1

2,3,3,3-Tetrafluoropropene

High-purity 2,3,3,3-Tetrafluoropropene (HFC-1234yf) gas for advanced refrigeration and blowing agent applications.

View Details →
Nucleating Agent 3988
CAS No. 135861-56-2

Nucleating Agent 3988

High-performance sorbitol-based clarifying agent designed for polyolefins, offering superior transparency, stiffness, and heat resistance.

View Details →