At NINGBO INNO PHARMCHEM CO.,LTD., our research is driven by a commitment to delivering highly effective chemical solutions. A significant aspect of our work on DAMP, a novel organophosphorus derivative, involves optimizing its application as a copper corrosion inhibitor in acid. This optimization is largely dependent on understanding the effect of inhibitor concentration on corrosion rate.

Our experimental investigations, including weight loss measurements and electrochemical studies, have clearly demonstrated a dose-dependent relationship between DAMP concentration and its protective efficacy. As the concentration of DAMP increases, the degree of surface coverage on the copper increases, leading to a more robust protective film. This enhanced coverage directly translates to a lower corrosion rate.

The studies revealed that DAMP exhibits significant inhibitory effects even at low concentrations. However, an optimal concentration range was identified to achieve maximum protection. Specifically, at 180 ppm, DAMP demonstrated the highest inhibition efficiencies, reaching up to 96.2% for copper in hydrochloric acid and 92.6% in sulfuric acid. Beyond this optimal concentration, further increases in DAMP did not yield proportionally higher inhibition, suggesting a saturation point for surface adsorption.

This detailed understanding of concentration-dependent performance is vital for practical applications. It allows for the efficient and economical use of DAMP, ensuring that industries can achieve maximum protection for their copper assets without unnecessary waste. NINGBO INNO PHARMCHEM CO.,LTD. leverages such data-driven insights to provide clients with tailored solutions for their specific corrosion challenges.