Advanced Organophosphorus Derivative for Enhanced Copper Corrosion Inhibition in Acidic Environments
Discover a novel solution for protecting copper against corrosive acidic conditions with superior performance.
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Organophosphorus Derivative
This advanced organophosphorus derivative, referred to as DAMP, has been rigorously studied for its exceptional performance in preventing copper corrosion in highly aggressive acidic environments like sulfuric and hydrochloric acids. Its efficacy stems from a strong adsorption mechanism onto the copper surface, forming a robust protective layer.
- Investigating the adsorption mechanism of copper corrosion inhibitor reveals DAMP's capability to chemisorb and physisorb onto copper surfaces through its heteroatoms (N, O, P) and pi electrons.
- Quantum chemical study of corrosion inhibitors highlights DAMP's favorable electronic structure, contributing to its potent protective action.
- Effect of inhibitor concentration on corrosion rate shows significant reduction in corrosion with increasing DAMP concentration, reaching optimal inhibition at 180 ppm.
- SEM EDX analysis of corrosion inhibitor confirms the deposition of a protective DAMP layer on the copper surface, significantly reducing damage.
Key Advantages
Superior Corrosion Protection
Achieve up to 96.2% inhibition efficiency for copper in HCl and 92.6% in H2SO4, offering unparalleled protection against acid-induced corrosion.
Effective Adsorption Mechanism
Leveraging advanced adsorption mechanisms, DAMP forms a stable protective film, showcasing strong Langmuir adsorption isotherm behavior for enhanced surface coverage.
Environmentally Conscious Solution
The synthesis and application of DAMP are designed to be cost-effective and environmentally friendly, aligning with green chemistry principles.
Key Applications
Acidic Metal Treatment
Protect copper components during acid pickling, cleaning, or etching processes, ensuring longevity and performance.
Industrial Cleaning
Utilize DAMP in industrial cleaning formulations designed for copper-based equipment exposed to acidic environments.
Chemical Processing
Ensure the integrity of copper equipment and pipelines in chemical processing plants where acidic conditions are prevalent.
Research & Development
Explore the application of DAMP in new formulations and research for advanced corrosion prevention strategies.