High-Purity Photoresist Material: Cyclopropanecarboxamide Derivative

Discover the advanced capabilities of our 1-Amino-N-(cyclopropylsulfonyl)-2-ethenyl-cyclopropanecarboxamide 4-Methylbenzenesulfonate (CAS: 1028252-16-5), a critical component for next-generation photoresist formulations. As a leading chemical supplier in China, we offer this high-purity (0.99) intermediate to empower your innovations in microelectronics.

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Why Choose Our Photoresist Chemical?

Exceptional Purity and Quality

With a purity of 0.99, our Cyclopropanecarboxamide derivative ensures consistent and reliable results in demanding microelectronic applications. We are a dedicated photoresist chemical supplier focused on quality.

Enabling Advanced Fabrication Processes

This CAS 1028252-16-5 intermediate is crucial for developing advanced photoresists, facilitating higher resolution patterns and improved device performance. It's a key component for any manufacturer seeking cutting-edge solutions.

Reliable Supply Chain

As a prominent chemical manufacturer in China, we guarantee a stable and dependable supply of this essential electronic chemical, ensuring your production lines run without interruption. We are your go-to source to buy chemicals.

Applications in Electronic Chemicals

Photoresist Formulations

Essential ingredient for crafting high-performance positive or negative photoresists, enabling precise pattern transfer in semiconductor manufacturing.

Microelectronics Fabrication

Critical for creating intricate circuit designs and microelectronic components, this chemical contributes to the miniaturization and efficiency of electronic devices.

Specialty Chemical Synthesis

Used as a valuable intermediate in the synthesis of advanced materials for the electronics sector, offering specific stereochemistry and functional groups.

R&D and Material Science

A vital material for researchers and developers exploring new frontiers in photolithography and advanced electronic materials.