High Purity Cyclopentanecarboxylic Acid Methyl Ester for Advanced Electronic Applications

Discover a high-purity (1R,2R,4S)-2-[(5-hexen-1-ylmethylamino)carbonyl]-4-[[7-methoxy-8-methyl-2-[4-(1-isopropyl)-2-thiazolyl]-4-quinolinyl]oxy]-Cyclopentanecarboxylic acid methyl ester (CAS 1042695-87-3), a crucial component in advanced photoresist formulations. Explore its applications in cutting-edge electronic manufacturing. Request a quote from our trusted supplier today.

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Key Advantages for Your Production Needs

Precision & Resolution

This photoresist chemical's precise molecular structure is engineered to deliver exceptional resolution and pattern fidelity, critical for sub-micrometer feature fabrication in semiconductor manufacturing.

Chemical Purity

We guarantee high chemical purity for our (1R,2R,4S)-2-[(5-hexen-1-ylmethylamino)carbonyl]-4-[[7-methoxy-8-methyl-2-[4-(1-isopropyl)-2-thiazolyl]-4-quinolinyl]oxy]-Cyclopentanecarboxylic acid methyl ester, ensuring consistent and reliable performance in your photoresist formulations and sensitive electronic processes.

Supply Chain Stability

As a dedicated manufacturer and supplier, we provide a stable and dependable source for this specialized electronic chemical, ensuring your production lines run without interruption. Get your quote today!

Core Applications in the Electronics Industry

Semiconductor Fabrication

Crucial for advanced lithography steps, enabling the creation of complex integrated circuits with high precision and yield.

Photoresist Formulations

A key ingredient for developing high-performance photoresists, contributing to critical pattern definition in microelectronics.

Advanced Electronic Materials

Utilized in the development and manufacturing of cutting-edge electronic components and display technologies.

Specialty Chemical Synthesis

Serves as a vital intermediate in custom synthesis projects for the electronics and advanced materials sectors.