(R)-3-Phenyllactic Acid (CAS 7326-19-4): Your Essential Electronic Chemical Component
Discover the critical role of (R)-3-Phenyllactic acid in advanced photoresist formulations. Sourced as a high-purity crystal powder, this chemical intermediate is vital for cutting-edge electronic manufacturing and chemical synthesis.
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R-3-Phenyllactic Acid
As a premier supplier in China, we offer high-purity (R)-3-Phenyllactic acid (CAS 7326-19-4), a vital component in the electronic chemicals sector, particularly for advanced photoresist applications. Its precise chemical structure and consistent quality make it an indispensable material for manufacturers seeking reliable performance.
- Explore the applications of R-3-Phenyllactic acid CAS 7326-19-4 in advanced photoresist formulations, ensuring optimal results in your manufacturing processes.
- Source high-purity R-3-Phenyllactic acid from trusted manufacturers in China, guaranteeing consistent quality and reliable supply chains.
- Understand the detailed chemical properties of CAS 7326-19-4, providing the foundational knowledge for its effective integration into your products.
- Discover efficient methods for advanced photoresist materials sourcing with our comprehensive product information and support.
Advantages Provided by the Product
Exceptional Purity for Critical Applications
Our R-3-Phenyllactic acid, sourced from leading manufacturers in China, boasts exceptional purity, making it ideal for demanding applications within the electronic chemicals sector, contributing to the overall reliability of advanced photoresist materials sourcing.
Versatile Chemical Intermediate
Serving as a versatile chemical intermediate, this compound finds essential use in chemical synthesis and is a key ingredient in the formulation of sophisticated photoresists, supporting innovation in electronic manufacturing.
Reliable Supply Chain Assurance
We ensure a stable and reliable supply of CAS 7326-19-4, offering peace of mind for businesses engaged in the critical area of advanced photoresist materials sourcing.
Key Applications
Photoresist Formulations
As a key component in photoresist development, R-3-Phenyllactic acid contributes to the precision and performance required in microelectronic fabrication, a core aspect of advanced photoresist materials sourcing.
Electronic Manufacturing
Its application in the broader electronic manufacturing sector underscores its importance as a specialty chemical, supporting the production of advanced electronic components and devices.
Chemical Synthesis
The compound serves as a valuable building block in various chemical synthesis pathways, enabling the creation of complex molecules for diverse industrial uses.
Material Science Research
Researchers exploring new frontiers in material science can leverage the unique properties of CAS 7326-19-4 for developing novel materials and processes.