Unlock Precision with Diphenyl-2,4,6-trimethylphenylsulfonium p-Toluenesulfonate

A high-purity photoacidogenic agent vital for advanced material applications and precise chemical reactions.

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Advantages You'll Experience

Exceptional Purity for Critical Processes

Achieve reliable and reproducible results in sensitive applications by using a photoacidogenic agent with an assay of ≥99.0%, supporting the development of advanced semiconductor photoresists.

Light-Activated Catalysis Efficiency

Experience the power of precise acid generation upon light exposure, ideal for optimizing UV curing processes in coatings, inks, and adhesives, contributing to faster production cycles.

Enabling Advanced Material Fabrication

Discover new possibilities in 3D printing and complex organic synthesis with this versatile intermediate, facilitating the creation of novel materials and sophisticated molecular structures.

Key Applications

Semiconductor Photoresists

Critical for photolithography in semiconductor manufacturing, enabling the precise patterning of microelectronic circuits through light-induced acid generation.

UV Curing Coatings, Inks, and Adhesives

Enhance the curing speed and performance of various materials, from protective coatings to high-strength adhesives, by initiating rapid polymerization.

3D Printing

Facilitate the stereolithography (SLA) and digital light processing (DLP) printing processes by triggering photopolymerization for intricate object creation.

Organic Synthesis

Serve as a versatile intermediate in complex chemical reactions, enabling efficient synthesis pathways for pharmaceuticals, agrochemicals, and other fine chemicals.