Bis(ethylcyclopentadienyl)ruthenium(II): A Catalyst for Advanced Thin Film Deposition

Explore the chemical catalyst properties and applications of Bis(ethylcyclopentadienyl)ruthenium(II) for cutting-edge electronic materials.

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Key Advantages Provided

Exceptional Purity

The high purity of Bis(ethylcyclopentadienyl)ruthenium(II) ensures consistent and reliable results in sensitive applications like ALD, contributing to the quality of manufactured electronic components.

ALD Versatility

Its role as an ALD precursor makes it invaluable for creating ultra-thin, conformal films, essential for advanced microelectronic structures and diffusion barriers.

Catalytic Efficiency

This organometallic compound acts as an effective chemical catalyst, accelerating reaction rates and improving yields in various chemical synthesis processes.

Key Applications

Atomic Layer Deposition (ALD)

Utilized as a precursor for depositing Ru and RuO2 thin films, critical for semiconductor interconnects and electrodes.

Semiconductor Manufacturing

Essential for creating diffusion barriers and seed layers in advanced microelectronic fabrication processes.

Catalysis

Employed as a versatile chemical catalyst in various organic synthesis and industrial chemical processes.

Materials Science Research

A valuable compound for researchers developing new materials and advanced deposition techniques.