Bis(ethylcyclopentadienyl)ruthenium(II): A Catalyst for Advanced Thin Film Deposition
Explore the chemical catalyst properties and applications of Bis(ethylcyclopentadienyl)ruthenium(II) for cutting-edge electronic materials.
Get a Quote & SampleProduct Core Value

Bis(ethylcyclopentadienyl)ruthenium(II)
Bis(ethylcyclopentadienyl)ruthenium(II) is a critical organometallic compound widely recognized for its role as a chemical catalyst. Its primary utility lies in advanced thin film deposition techniques, particularly Atomic Layer Deposition (ALD), where it serves as a precursor for depositing ruthenium (Ru) and ruthenium dioxide (RuO2) nanorods. The compound's specific chemical properties, including its liquid form and high purity, make it an essential material for manufacturing next-generation electronic devices and components.
- As a high purity Bis(ethylcyclopentadienyl)ruthenium(II) for electronics, this chemical catalyst enables precise thin film deposition processes.
- Understanding the chemical catalyst properties of Bis(ethylcyclopentadienyl)ruthenium(II) is crucial for optimizing ALD applications.
- The Bis(ethylcyclopentadienyl)ruthenium(II) CAS 32992-96-4 is a key enabler for creating high-performance Ru thin films.
- As a Diethylruthenocene catalyst, it facilitates efficient chemical transformations in semiconductor manufacturing.
Key Advantages Provided
Exceptional Purity
The high purity of Bis(ethylcyclopentadienyl)ruthenium(II) ensures consistent and reliable results in sensitive applications like ALD, contributing to the quality of manufactured electronic components.
ALD Versatility
Its role as an ALD precursor makes it invaluable for creating ultra-thin, conformal films, essential for advanced microelectronic structures and diffusion barriers.
Catalytic Efficiency
This organometallic compound acts as an effective chemical catalyst, accelerating reaction rates and improving yields in various chemical synthesis processes.
Key Applications
Atomic Layer Deposition (ALD)
Utilized as a precursor for depositing Ru and RuO2 thin films, critical for semiconductor interconnects and electrodes.
Semiconductor Manufacturing
Essential for creating diffusion barriers and seed layers in advanced microelectronic fabrication processes.
Catalysis
Employed as a versatile chemical catalyst in various organic synthesis and industrial chemical processes.
Materials Science Research
A valuable compound for researchers developing new materials and advanced deposition techniques.