4-Acetoxystyrene (CAS 2628-16-2): Essential Monomer for Advanced Photoresists & Polymer Synthesis
Discover 4-Acetoxystyrene, the key chemical intermediate empowering cutting-edge innovations in semiconductor manufacturing and high-performance polymer development. Explore its versatile applications and superior properties for your next breakthrough.
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4-Acetoxystyrene
4-Acetoxystyrene (CAS 2628-16-2) is a highly versatile and stable styrene derivative, foundational for creating advanced materials across various industries. Its unique chemical structure makes it an indispensable precursor for poly(p-hydroxystyrene), a critical component in chemically amplified photoresists that drive modern microelectronics. This compound excels in its ability to undergo controlled polymerization, providing chemists and material scientists with unparalleled flexibility in developing high-performance polymers tailored for specific applications, from specialized adhesives to robust coatings.
- Precursor for Poly(p-hydroxystyrene): 4-Acetoxystyrene is the vital precursor to poly(p-hydroxystyrene), a cornerstone material for semiconductor manufacturing.
- Core Component for Photoresists: This monomer is crucial in formulating advanced photoresists, enabling precise patterns for integrated circuits.
- Versatile in Polymer Synthesis: Engage in controlled polymerization techniques like ATRP of 4-Acetoxystyrene to create specialized polymers with tailored properties.
- Enhances Material Performance: Utilize 4-Acetoxystyrene polymer synthesis to develop materials for high-performance adhesives and advanced coatings.
Key Advantages of 4-Acetoxystyrene
Enhanced Polymer Properties
Grafting 4-Acetoxystyrene onto polypropylene significantly improves electrical properties, including DC resistivity and breakdown strength, making it ideal for advanced insulation.
Precision in Polymerization
With controlled radical polymerization techniques like RAFT polymerization 4-Acetoxystyrene, achieve polymers with narrow molecular weight distributions and predictable structures.
Versatile Chemical Reactivity
Its structure allows for 4-Acetoxystyrene derivatization to p-hydroxystyrene, opening pathways for a wide range of functional materials and specialty chemicals.
Key Applications
Semiconductor Manufacturing
Essential for microlithography processes, 4-Acetoxystyrene forms the backbone of photoresist polymers, crucial for advanced microchip production.
Advanced Materials & Coatings
Utilized in polymer synthesis, this compound contributes to high-performance adhesives and protective coatings with enhanced durability.
Epoxy Resin Systems
As a curing agent, 4-Acetoxystyrene improves the performance of epoxy resins, enhancing their strength and chemical resistance in various applications.
Specialty Chemical Production
Serving as a versatile chemical intermediate, it facilitates the synthesis of complex organic compounds, including trans-Resveratrol 3-O-β-D-Glucuronide.