Patterning Highly Ordered Arrays of Complex Nanofeatures with LB-100 Photoresist
Discover the cutting-edge capabilities of LB-100, a non-chemically amplified photoresist designed for advanced EUV lithography. Achieve superior resolution and pattern transfer for your microelectronic needs. Contact us for a quote and sample.
Get a Quote & SampleAdvanced Nanopatterning with LB-100
LB-100
As a leading supplier of electronic chemicals in China, we offer LB-100, a high-performance negative-tone photoresist. This material is crucial for achieving sub-34nm feature sizes in advanced nanofabrication processes, making it an essential component for semiconductor manufacturers seeking superior resolution and reliable pattern transfer.
- High Resolution: Achieve complex nanofeatures down to 34nm, meeting the demands of next-generation microelectronics.
- Non-Chemically Amplified: Simplified process with inherent radiation sensitivity, reducing process complexity and potential defects.
- Excellent Etch Resistance: Ensures efficient pattern transfer into silicon substrates, vital for robust semiconductor manufacturing.
- Supplier Reliability: Source LB-100 from a trusted manufacturer for consistent quality and supply chain stability.
Key Advantages of LB-100
Precision Nanofabrication
Our LB-100 photoresist enables the precise patterning of complex nanofeatures, essential for high-density data storage and advanced electronic devices. Explore bulk purchase options from our dedicated manufacturer.
Simplified Processing
As a non-chemically amplified resist, LB-100 offers a more streamlined and robust process compared to traditional chemically amplified resists, reducing post-exposure bake sensitivity and potential line-edge roughness issues.
Cost-Effective Solution
We are a competitive supplier of LB-100, offering attractive pricing for bulk orders. Contact us for a detailed quote and to discuss how our materials can optimize your production costs.
Applications of LB-100
EUV Lithography
Ideal for Extreme Ultraviolet (EUV) lithography, LB-100 facilitates the creation of ultrafine nanofeatures critical for advanced semiconductor nodes. Inquire about current LB-100 pricing.
Microelectronics Manufacturing
A key material for producing integrated circuits, micro-lens arrays, and other microelectronic components requiring high-resolution patterning.
Photonic Crystals
Used in the fabrication of photonic crystals and advanced optical devices that rely on precise nanostructure patterning.
Information Storage
Contributes to the development of next-generation high-density information storage media by enabling the patterning of extremely small data bits.