4-Ethenylphenol Acetate: The Backbone of Advanced Photoresists

Unlock precision in microelectronics with a key monomer for cutting-edge photoresist formulations.

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Product Advantages

Exceptional Purity

Boasting a purity of 99% or higher, this compound is ideal for demanding applications where trace impurities can significantly impact performance, especially in high purity ethenylphenol acetate formulations.

Enabling Microfabrication

Its use in synthesizing chemically amplified photoresists directly supports the progression of lithography technology, allowing for the creation of increasingly intricate circuit patterns as part of advanced photoresist materials.

Versatile Chemical Intermediate

Beyond photoresists, it serves as a valuable building block in various organic synthesis pathways, reinforcing its status as a key polymer synthesis precursor.

Key Applications

Photoresist Synthesis

Critical for creating photoresist formulations used in microlithography for integrated circuit manufacturing, directly impacting chip resolution and performance, making it a key part of electronic chemicals for semiconductor lithography.

Semiconductor Manufacturing

Essential for etching processes in chip production, facilitating the creation of complex circuitry and smaller transistor sizes, a core aspect of microelectronics.

Advanced Electronic Materials

Serves as a precursor for polymers used in various electronic components, contributing to the development of next-generation devices through high purity ethenylphenol acetate.

Polymerization Processes

Acts as a versatile monomer in various polymerization reactions, enabling the creation of specialized polymers with tailored properties for industrial applications, linking to polymer synthesis precursors.