Tris(dimethylamino)silane: Properties, Applications, and Safety of a Versatile Organosilicon Compound
Explore the key characteristics and uses of Tris(dimethylamino)silane, a crucial chemical in advanced material deposition.
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Tris(dimethylamino)silane
Tris(dimethylamino)silane (CAS 15112-89-7) is a vital organosilicon compound renowned for its utility in advanced material science. Its unique chemical structure makes it an excellent precursor for silicon nitride deposition via ALD and CVD, contributing to the creation of high-quality thin films essential in microelectronics and semiconductor manufacturing.
- Explore the capabilities of Tris(dimethylamino)silane CAS 15112-89-7 as a key precursor for ALD silicon nitride deposition, enabling precise thin-film growth.
- Understand the role of this organosilicon compound in CVD silicon nitride deposition processes, crucial for fabricating advanced electronic components.
- Learn about the hydrosilylation catalyst properties of Tris(dimethylamino)silane, facilitating various organic synthesis reactions.
- Discover the safe handling practices for reactive silanes like Tris(dimethylamino)silane, ensuring operational safety in laboratories and industrial settings.
Advantages Offered by the Product
Precise Thin Film Deposition
The use of Tris(dimethylamino)silane in ALD processes allows for atomic-level control over film thickness and composition, leading to superior performance in microelectronic devices.
Enhanced Material Properties
Deposited silicon nitride films using this precursor exhibit excellent dielectric properties, thermal stability, and chemical resistance, vital for demanding applications.
Versatile Chemical Reactivity
Beyond deposition, Tris(dimethylamino)silane's role as a hydrosilylation catalyst broadens its applicability in organic synthesis, enabling efficient chemical transformations.
Key Applications
Atomic Layer Deposition (ALD)
Tris(dimethylamino)silane is a critical precursor for depositing conformal and pinhole-free thin films of silicon nitride, essential for gate dielectrics and passivation layers in semiconductors.
Chemical Vapor Deposition (CVD)
It is employed in low-pressure CVD processes for silicon nitride, offering a reliable method for producing high-quality nitride layers with tunable properties.
Hydrosilylation Reactions
The compound acts as a catalyst in hydrosilylating olefins, a fundamental reaction in organic chemistry for creating new carbon-silicon bonds and functionalized molecules.
Chemical Synthesis
Tris(dimethylamino)silane can react with ammonia to form silicon nitride prepolymers, serving as a building block in various chemical synthesis pathways.